High-energy ion-implantation of a moderately deep acceptor Hg into liquid encapsulated Czochralski grown GaAs: formation of new shallow emission bands

K. Harada*, Y. Makita, H. Shibata, B. Lo, A. C. Beye, M. P. Halsall, S. Kimura, Naoto Kobayashi, T. Iida, T. Shima, A. Obara

*この研究の対応する著者

研究成果: Conference contribution

抄録

Hg (mercury) in GaAs is known to be a moderately deep acceptor impurity, having a 52 meV activation energy. Optical properties of Hg acceptors in GaAs were systematically investigated as a function of Hg concentration, [Hg]. Samples were prepared by high-energy ion-implantation of Hg + into GaAs grown by the liquid encapsulated Czochralski (LEC) method. Heat treatment was made by furnace annealing and rapid thermal annealing. Photoluminescence measurements at 2K revealed that the Hg-related so-called 'g' line is formed in addition to the well-defined conduction band-to-Hg acceptor transition, (e, Hg). Additionally, three shallow emissions are formed for net hole concentrations |N A-N D| greater than 2×10 17 cm -3. This is the first demonstration that even Hg in GaAs makes multiple shallow emissions due to acceptor-acceptor pairs and LEC GaAs can be used for the investigations of these emissions.

本文言語English
ホスト出版物のタイトルMaterials Research Society Symposium - Proceedings
出版社Materials Research Society
ページ835-840
ページ数6
396
出版ステータスPublished - 1996
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料

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