High-quality SiO2 film formation by highly concentrated ozone gas at below 600°C
Tetsuya Nishiguchi*, Hidehiko Nonaka, Shingo Ichimura, Yoshiki Morikawa, Mitsuru Kekura, Masaharu Miyamoto
*この研究の対応する著者
研究成果: Article › 査読
48
被引用数
(Scopus)