Increasing the resistivity of electrodeposited high BS CoNiFe thin film

Tokihiko Yokoshima; Manabu Kaseda; Masahiro Yamada; Takuya Nakanishi; Toshiyuki Momma; Tetsuya Osaka

doi:10.1109/20.800871

Increasing the resistivity of electrodeposited high B_S CoNiFe thin film

Tokihiko Yokoshima, Manabu Kaseda, Masahiro Yamada, Takuya Nakanishi, Toshiyuki Momma, Tetsuya Osaka

研究成果: Article › 査読

25 被引用数 (Scopus)

抄録

In order to increase the resistivity of electrodeposited high B_S CoNiFe thin film, the effect of an organic additive such as diethylenetriamine (DET) added to the plating bath was investigated. The values of ρ and H_C, were gradually increased as a function of DET concentration. The desirable soft magnetic CoNiFe thin film with ρ = 25-90 μΩ-cm under the conditions of B_S > 1.9 T and H_C < 2.5 Oe was developed as function of carbon in the deposited films. Additionally, the high resistivity CoNiFe thin film with ρ = 130 μΩ-cm was established under the conditions of B_S= 1.7 T and H_C < 6 Oe.

本文言語	English
ページ（範囲）	2499-2501
ページ数	3
ジャーナル	IEEE Transactions on Magnetics
巻	35
号	5 PART 1
DOI	https://doi.org/10.1109/20.800871
出版ステータス	Published - 1999

ASJC Scopus subject areas

電子材料、光学材料、および磁性材料
電子工学および電気工学

文献へのアクセス

10.1109/20.800871

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引用スタイル

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title = "Increasing the resistivity of electrodeposited high BS CoNiFe thin film",

abstract = "In order to increase the resistivity of electrodeposited high BS CoNiFe thin film, the effect of an organic additive such as diethylenetriamine (DET) added to the plating bath was investigated. The values of ρ and HC, were gradually increased as a function of DET concentration. The desirable soft magnetic CoNiFe thin film with ρ = 25-90 μΩ-cm under the conditions of BS > 1.9 T and HC < 2.5 Oe was developed as function of carbon in the deposited films. Additionally, the high resistivity CoNiFe thin film with ρ = 130 μΩ-cm was established under the conditions of BS= 1.7 T and HC < 6 Oe.",

keywords = "Electrodeposition, High b high resistivity, Soft magnetic thin film",

author = "Tokihiko Yokoshima and Manabu Kaseda and Masahiro Yamada and Takuya Nakanishi and Toshiyuki Momma and Tetsuya Osaka",

note = "Funding Information: E-mail:osakatet@mnw. aseda.ac.jp The work was done with financial supports of the future project “Advanced Research and Development on Ultra High Magnetic Recording Device by means of Atomic Design” of the Japan Society for the Promotion of Science(JSPS-RFTF97Rl4401),t he Storage Research Consortium(SRC) and the Grant-in-Aid for Scientific Research on Priority Area of “Electrochemistry of Ordered Interfaces” from Ministry of Education, Science, Sports and Culture, Japan. .",

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AU - Yokoshima, Tokihiko

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AU - Yamada, Masahiro

AU - Nakanishi, Takuya

AU - Momma, Toshiyuki

AU - Osaka, Tetsuya

N1 - Funding Information: E-mail:osakatet@mnw. aseda.ac.jp The work was done with financial supports of the future project “Advanced Research and Development on Ultra High Magnetic Recording Device by means of Atomic Design” of the Japan Society for the Promotion of Science(JSPS-RFTF97Rl4401),t he Storage Research Consortium(SRC) and the Grant-in-Aid for Scientific Research on Priority Area of “Electrochemistry of Ordered Interfaces” from Ministry of Education, Science, Sports and Culture, Japan. .

PY - 1999

Y1 - 1999

N2 - In order to increase the resistivity of electrodeposited high BS CoNiFe thin film, the effect of an organic additive such as diethylenetriamine (DET) added to the plating bath was investigated. The values of ρ and HC, were gradually increased as a function of DET concentration. The desirable soft magnetic CoNiFe thin film with ρ = 25-90 μΩ-cm under the conditions of BS > 1.9 T and HC < 2.5 Oe was developed as function of carbon in the deposited films. Additionally, the high resistivity CoNiFe thin film with ρ = 130 μΩ-cm was established under the conditions of BS= 1.7 T and HC < 6 Oe.

AB - In order to increase the resistivity of electrodeposited high BS CoNiFe thin film, the effect of an organic additive such as diethylenetriamine (DET) added to the plating bath was investigated. The values of ρ and HC, were gradually increased as a function of DET concentration. The desirable soft magnetic CoNiFe thin film with ρ = 25-90 μΩ-cm under the conditions of BS > 1.9 T and HC < 2.5 Oe was developed as function of carbon in the deposited films. Additionally, the high resistivity CoNiFe thin film with ρ = 130 μΩ-cm was established under the conditions of BS= 1.7 T and HC < 6 Oe.

KW - Electrodeposition

KW - High b high resistivity

KW - Soft magnetic thin film

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