Continuous nano structures whose sizes 100 nm line and space were successfully fabricated using two step nanoimprint including oxygen (O 2) plasma irradiation on a silicon substrate in 8 × 56 mm 2 area. Silicon substrate surface condition is important property because fine and continuous pattern forming depend on photo curable resin uniform coating. O 2 plasma irradiation is realized to change into hydrophilic without damage for silicon substrate. The water contact angle was decreased to smaller than 40° after O 2 plasma irradiation. Therefore O 2 plasma irradiation has an advantage of treatment process for continuous nanostructure forming. Our activities on UV nanoimprint lithography are expected to be progress for large area continuous nano structures fabrication.
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