Low temperature synthesis of extremely dense and vertically aligned single-walled carbon nanotubes

Guofang Zhong*, Takayuki Iwasaki, Kotaro Honda, Yukio Furukawa, Iwao Ohdomari, Hiroshi Kawarada

*この研究の対応する著者

研究成果: Article査読

136 被引用数 (Scopus)

抄録

A novel point-arc microwave plasma chemical vapor deposition (CVD) apparatus was employed to grow single-walled carbon nanotubes (SWNTs) on Si substrates coated with a sandwich-like nano-layer structure of 0.7 nm Al 2O3 (top)/0.5nm Fe/ 5-70 nm Al2O3 by conventional high frequency sputtering. The growth of extremely dense and vertically aligned SWNTs with an almost constant growth rate of 270 μm/h within 40 min at a temperature as low as 600°C was demonstrated for the first time. The volume density of the as-grown SWNT films is as higher as 66kg/m3.

本文言語English
ページ(範囲)1558-1561
ページ数4
ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
44
4 A
DOI
出版ステータスPublished - 2005 4月

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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