TY - JOUR
T1 - Mechanism of positronium formation in mixtures of fluorinated benzenes and n-Hexane
AU - Zhicheng, Zhang
AU - Ito, Yasuo
AU - Washio, Masakazu
AU - Tabata, Yoneho
PY - 1987
Y1 - 1987
N2 - Positrinium yield (I3) in binary mixturesof benzene derivatives(p-difluorobenzene 1,2,4,5-tetrafluorobenzene, pentafluorobenzene, perfluorobenzene and p-xylene) in n-hexane has been measured. As additives all of the aromatic compounds have been found to enhance Ps yield in n-hexane, but the effect was unexpectedly smaller for 1,2,4,5-C6H2F4. It is proposed that there are at least three processes which lead to the enhancement: anti-recombination by scavenging excess electrons, anti-recombination by scavenging positive holes, and electron abstraction from excited molecular states. Addition of a small amount of n-hexane in the fluorinated benzenes resultedin a decrease in the Ps yield to a different degree which strongly depended on the number of flourine atoms substituted. Discussion is made on the Ps formation mechanism taking into account possible role of excited molecular states.
AB - Positrinium yield (I3) in binary mixturesof benzene derivatives(p-difluorobenzene 1,2,4,5-tetrafluorobenzene, pentafluorobenzene, perfluorobenzene and p-xylene) in n-hexane has been measured. As additives all of the aromatic compounds have been found to enhance Ps yield in n-hexane, but the effect was unexpectedly smaller for 1,2,4,5-C6H2F4. It is proposed that there are at least three processes which lead to the enhancement: anti-recombination by scavenging excess electrons, anti-recombination by scavenging positive holes, and electron abstraction from excited molecular states. Addition of a small amount of n-hexane in the fluorinated benzenes resultedin a decrease in the Ps yield to a different degree which strongly depended on the number of flourine atoms substituted. Discussion is made on the Ps formation mechanism taking into account possible role of excited molecular states.
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U2 - 10.1016/1359-0197(87)90149-4
DO - 10.1016/1359-0197(87)90149-4
M3 - Article
AN - SCOPUS:50849152234
SN - 0969-806X
VL - 30
SP - 47
EP - 50
JO - Radiation Physics and Chemistry
JF - Radiation Physics and Chemistry
IS - 1
ER -