TY - JOUR
T1 - Memory array architecture and decoding scheme for 3 V only sector erasable DINOR flash memory
AU - Kobayashi, Shin ichi
AU - Nakai, Hiroaki
AU - Kunori, Yuichi
AU - Nakayama, Takeshi
AU - Miyawaki, Yoshikazu
AU - Terada, Yasushi
AU - Onoda, Hiroshi
AU - Ajika, Natsuo
AU - Hatanaka, Masahiro
AU - Miyoshi, Hirokazu
AU - Yoshihara, Tsutomu
PY - 1994/4
Y1 - 1994/4
N2 - A memory array architecture and row decoding scheme for a 3 V only DINOR (divided bit line NOR) flash memory has been designed. A new sector organization realizes one word line driver per two word lines, which is conformable to tight word line pitch. A hierarchical negative voltage switching row decoder and a compact source line driver have been developed for 1 K byte sector erase without increasing the chip size. A bit-by-bit programming control and a low threshold voltage detection circuit provide a high speed random access time at low Vcc and a narrow program threshold voltage distribution. A 4 Mb DINOR flash memory test device was fabricated from 0.5 μm, double-layer metal, triple polysilicon, triple well CMOS process. The cell measures 1.8 × 1.6 μm2 and the chip measures 5.8 × 5.0 mm2. The divided bit line structure realizes a small NOR type memory cell.
AB - A memory array architecture and row decoding scheme for a 3 V only DINOR (divided bit line NOR) flash memory has been designed. A new sector organization realizes one word line driver per two word lines, which is conformable to tight word line pitch. A hierarchical negative voltage switching row decoder and a compact source line driver have been developed for 1 K byte sector erase without increasing the chip size. A bit-by-bit programming control and a low threshold voltage detection circuit provide a high speed random access time at low Vcc and a narrow program threshold voltage distribution. A 4 Mb DINOR flash memory test device was fabricated from 0.5 μm, double-layer metal, triple polysilicon, triple well CMOS process. The cell measures 1.8 × 1.6 μm2 and the chip measures 5.8 × 5.0 mm2. The divided bit line structure realizes a small NOR type memory cell.
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U2 - 10.1109/4.280695
DO - 10.1109/4.280695
M3 - Article
AN - SCOPUS:0028419935
SN - 0018-9200
VL - 29
SP - 454
EP - 458
JO - IEEE Journal of Solid-State Circuits
JF - IEEE Journal of Solid-State Circuits
IS - 4
ER -