Microbubble formation from ionic vacancies in copper electrodeposition under a high magnetic field

Makoto Miura^*, Ryoichi Aogaki, Yoshinobu Oshikiri, Atsushi Sugiyama, Ryoichi Morimoto, Miki Miura, Iwao Mogi, Yusuke Yamauchi

^*この研究の対応する著者