抄録
Dynamical phenomena during the solid phase epitaxy (SPE) of guest-free Si clathrates (Si34 and Si46) via molecular-dynamics (MD) simulations using the Tersoff potential have been reported. The activation energy of SPE for Si34 has been found to correspond with the experimental value for the cubic diamond phase (c-Si; approximately 2.7eV), while the SPE rates of Si46 are much lower than that of c-Si. The structural transition from Si46 (type-I) to Si34 (type-II) can be also observed during the Si46 [001] SPE. The present results suggest that it is worthwhile to intensify experimental studies concerning crystal growth techniques of clathrate materials and these interesting Si forms may open up a new field in "silicon technologies".
本文言語 | English |
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ホスト出版物のタイトル | Materials Research Society Symposium - Proceedings |
ページ | 457-462 |
ページ数 | 6 |
巻 | 691 |
出版ステータス | Published - 2002 |
外部発表 | はい |
イベント | Thermoelectric Materials 2001-Research and Applications - Boston, MA, United States 継続期間: 2001 11月 26 → 2001 11月 29 |
Other
Other | Thermoelectric Materials 2001-Research and Applications |
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国/地域 | United States |
City | Boston, MA |
Period | 01/11/26 → 01/11/29 |
ASJC Scopus subject areas
- 電子材料、光学材料、および磁性材料