抄録
Recently, the transition metal dichalcogenide (TMDC) monolayers, such as MoS2, MoSe2 and WSe2, have attracted considerable interest because of its high carrier mobility, mechanical strength, large intrinsic bandgap and optical properties. Although many researches have been done by mechanically exfoliated TMDC monolayers, the chemical vapour deposition (CVD) growth of TMDC thin films that could be transferred onto other arbitrary substrates was reported, thereby providing a path forward to develop large-area CMOS electronics built onto flexible plastic and stretchable rubber substrates. Here, we firstly demonstrate the fabrication of CVD-growth MoS 2 thin-film transistors (TFTs) using ion gel as elastic gate dielectrics, opening a route for atomically thin electronics and optoelectronics on flexible and stretchable substrates.
本文言語 | English |
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ホスト出版物のタイトル | Proceedings of AM-FPD 2014 - The 21st International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials |
出版社 | IEEE Computer Society |
ページ | 283-286 |
ページ数 | 4 |
ISBN(印刷版) | 9784863483958 |
DOI | |
出版ステータス | Published - 2014 |
イベント | 21st International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials, AM-FPD 2014 - Kyoto 継続期間: 2014 7月 2 → 2014 7月 4 |
Other
Other | 21st International Workshop on Active-Matrix Flatpanel Displays and Devices: TFT Technologies and FPD Materials, AM-FPD 2014 |
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City | Kyoto |
Period | 14/7/2 → 14/7/4 |
ASJC Scopus subject areas
- ハードウェアとアーキテクチャ
- 電子工学および電気工学