Origin of photoluminescence around 2.6-2.9 eV in silicon oxynitride

Takashi Noma*, Kwang Soo Seol, Hiromitsu Kato, Makoto Fujimaki, Yoshimichi Ohki

*この研究の対応する著者

研究成果: Article査読

35 被引用数 (Scopus)

抄録

A broad photoluminescence (PL) around 2.6-2.9 eV is known to appear in hydrogenated silicon oxynitride. Although its origin was reported to be Si-N bonds, it is not so clear since the material contains hydrogen. In the present research, we have confirmed that the same PL appears in silicon oxynitride grown by nitriding of silicon dioxide. The depth profile of the PL intensity agrees with that of the nitrogen concentration. Furthermore, the emission spectrum, excitation spectrum, and decay constant of this PL agree with those of the PL observed in silicon nitride. Based on these results and theoretical discussion, the origin of the 2.6-2.9 eV PL is estimated to be Si-N bonds.

本文言語English
ページ(範囲)1995-1997
ページ数3
ジャーナルApplied Physics Letters
79
13
DOI
出版ステータスPublished - 2001 9月 24

ASJC Scopus subject areas

  • 物理学および天文学(その他)

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