TY - JOUR
T1 - Paramagnetic centers induced by ArF excimer laser irradiation in high-purity silica glasses
AU - Nishikawa, H.
AU - Nakamura, R.
AU - Tohmon, R.
AU - Ohki, Y.
AU - Hama, Y.
AU - Sakurai, Y.
AU - Nagasawa, K.
PY - 1990/12/1
Y1 - 1990/12/1
N2 - High-purity silica glasses prepared by various manufacturing methods were investigated after irradiation with an ArF excimer laser. Defect species and concentrations were found to be dependent on oxygen stoichiometry and impurities: E′ centers are induced in oxygen-deficient high-OH silica at concentrations of 1016/cm3, while at one or two orders of lower concentrations in other types of samples. Defect centers in γ-irradiated silicas studied for comparison, show a similar dependency on oxygen stoichiometry and impurities. In addition, O2- ions are observed in oxygen-surplus samples after γ-irradiation, which were created presumably by the trapping of free electrons. Isochronal annealing experiments indicate that the annealing of E′ centers in ArF-laser irradiated samples are due to the diffusion of O2 and H2O.
AB - High-purity silica glasses prepared by various manufacturing methods were investigated after irradiation with an ArF excimer laser. Defect species and concentrations were found to be dependent on oxygen stoichiometry and impurities: E′ centers are induced in oxygen-deficient high-OH silica at concentrations of 1016/cm3, while at one or two orders of lower concentrations in other types of samples. Defect centers in γ-irradiated silicas studied for comparison, show a similar dependency on oxygen stoichiometry and impurities. In addition, O2- ions are observed in oxygen-surplus samples after γ-irradiation, which were created presumably by the trapping of free electrons. Isochronal annealing experiments indicate that the annealing of E′ centers in ArF-laser irradiated samples are due to the diffusion of O2 and H2O.
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M3 - Conference article
AN - SCOPUS:0025539363
SN - 0277-786X
VL - 1327
SP - 69
EP - 78
JO - Proceedings of SPIE - The International Society for Optical Engineering
JF - Proceedings of SPIE - The International Society for Optical Engineering
T2 - Properties and Characteristics of Optical Glass II
Y2 - 12 July 1990 through 13 July 1990
ER -