抄録
We have developed high-sensitivity in-situ measurement technology based on photons with visible to ultraviolet wavelength bands. This measurement technology builds on plasmatizing particles technology and a high-sensitivity measurement technology for measuring photons from the plasma. We have investigated the condition for measuring particle sizes and the constituent element.
| 本文言語 | English |
|---|---|
| ホスト出版物のタイトル | Proceedings of the SICE Annual Conference |
| ページ | 3717-3720 |
| ページ数 | 4 |
| 出版ステータス | Published - 2005 |
| イベント | SICE Annual Conference 2005 - Okayama 継続期間: 2005 8月 8 → 2005 8月 10 |
Other
| Other | SICE Annual Conference 2005 |
|---|---|
| City | Okayama |
| Period | 05/8/8 → 05/8/10 |
ASJC Scopus subject areas
- 工学（全般）