TY - GEN
T1 - Photodetector using surface-plasmon antenna for optical interconnect
AU - Ohashi, Keishi
AU - Fujikata, Junichi
PY - 2008/12/1
Y1 - 2008/12/1
N2 - We used a surface-plasmon antenna to obtain small photodetectors for LSI on-chip optical interconnection by using near-field light generated by the antenna. Such near-field devices are not constrained by the diffraction limit and they offer an approach to integrated nanoscale photonic devices. A small semiconductor structure is located near the antenna to absorb the near-field light. This structure can be made as small as the Schottky depletion layer, so the separation between electrodes can be reduced to almost the size of the near-field region. We have demonstrated a "Si nano-photodiode" or plasmon photodiode that uses the near-field localized in a subwavelength region, which is usually relatively large in size because of the long absorption length for Si (∼10 μm at a wavelength of ∼800 nm). The Si nano-photodiode has a fast impulse response with a full-width at half-maximum of ∼20 ps even when the bias voltage is small (∼1 V or less). We demonstrated an on-chip optical interconnect chip to operate circuitry in an LSI chip by using waveguide-coupled Si nano-photodiodes.
AB - We used a surface-plasmon antenna to obtain small photodetectors for LSI on-chip optical interconnection by using near-field light generated by the antenna. Such near-field devices are not constrained by the diffraction limit and they offer an approach to integrated nanoscale photonic devices. A small semiconductor structure is located near the antenna to absorb the near-field light. This structure can be made as small as the Schottky depletion layer, so the separation between electrodes can be reduced to almost the size of the near-field region. We have demonstrated a "Si nano-photodiode" or plasmon photodiode that uses the near-field localized in a subwavelength region, which is usually relatively large in size because of the long absorption length for Si (∼10 μm at a wavelength of ∼800 nm). The Si nano-photodiode has a fast impulse response with a full-width at half-maximum of ∼20 ps even when the bias voltage is small (∼1 V or less). We demonstrated an on-chip optical interconnect chip to operate circuitry in an LSI chip by using waveguide-coupled Si nano-photodiodes.
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M3 - Conference contribution
AN - SCOPUS:77952120664
SN - 9781615677719
T3 - Materials Research Society Symposium Proceedings
SP - 21
EP - 32
BT - Applications of Group IV Semiconductor Nanostructures
T2 - 2008 MRS Fall Meeting
Y2 - 1 December 2008 through 5 December 2008
ER -