Photoinduced decomposition of alkyl monolayers using 172 nm vacuum ultraviolet light

Naoto Shirahata*, Kotaro Oda, Shuuichi Asakura, Akio Fuwa, Yoshiyuki Yokogawa, Tetsuya Kameyama, Atsushi Hozumi

*この研究の対応する著者

    研究成果: Article査読

    1 被引用数 (Scopus)

    抄録

    The vacuum ultraviolet (VUV) light induced decomposition in alkyl monolayers was investigated. The alkylsilane monolayer was formed on the silicon substrate from otadecyltrimethoxysilane monolayer (OTSM). The photodecomposition of the alkyl monolayer was investigated under VUV irradiation conducted at 10 and 105 Pa. The photodecomposition rate at 10 5 Pa was found to be smaller than that at 10 Pa. An increase in the carboxyl coverage on the surface of silicon was observed with increasing VUV irradiation time ranging from 0 to 60 s at 10 Pa, which decreased after 60 s.

    本文言語English
    ページ(範囲)1615-1619
    ページ数5
    ジャーナルJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
    22
    4
    DOI
    出版ステータスPublished - 2004 7月

    ASJC Scopus subject areas

    • 表面、皮膜および薄膜
    • 表面および界面
    • 物理学および天文学(その他)

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