TY - JOUR
T1 - Quality control of epitaxial LiCoO2 thin films grown by pulsed laser deposition
AU - Ohnishi, T.
AU - Hang, B. T.
AU - Xu, X.
AU - Osada, M.
AU - Takada, K.
PY - 2010/10
Y1 - 2010/10
N2 - Thin films of c-axis-oriented LiCoO2were epitaxially grown by pulsed laser deposition (PLD). The ablation laser conditions greatlyaffect the crystal quality of the epitaxial LiCoO2thin films. In addition, high-quality LiCoO2thin films were found to grow without any impurity phases under relatively low oxygen partial pressure,although high pressure had been often selected to suppress the formation of Co3O4 with a lower valence state as an impurity.This result clearly indicates that the ablation laser conditions are an essential growth parameter, and that composition control is indispensable to grow high-quality complex compound thin films by PLD.
AB - Thin films of c-axis-oriented LiCoO2were epitaxially grown by pulsed laser deposition (PLD). The ablation laser conditions greatlyaffect the crystal quality of the epitaxial LiCoO2thin films. In addition, high-quality LiCoO2thin films were found to grow without any impurity phases under relatively low oxygen partial pressure,although high pressure had been often selected to suppress the formation of Co3O4 with a lower valence state as an impurity.This result clearly indicates that the ablation laser conditions are an essential growth parameter, and that composition control is indispensable to grow high-quality complex compound thin films by PLD.
UR - http://www.scopus.com/inward/record.url?scp=77958089172&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=77958089172&partnerID=8YFLogxK
U2 - 10.1557/jmr.2010.0250
DO - 10.1557/jmr.2010.0250
M3 - Article
AN - SCOPUS:77958089172
SN - 0884-2914
VL - 25
SP - 1886
EP - 1889
JO - Journal of Materials Research
JF - Journal of Materials Research
IS - 10
ER -