抄録
For mounting electronic components through contact pressure using elastic adhesives, a high contact resistance is an inevitable issue in achieving solderless wiring in a low-temperature and low-cost process. To decrease the contact resistance, we investigated the resistance change mechanism by measuring the contact resistance with various contact pressures and copper layer thicknesses. The contact resistivity decreased to 4.2 × 10-8 Ω·m2 as the contact pressure increased to 800 kPa and the copper layer thickness decreased to 5 μm. In addition, we measured the change in the total resistance with various copper layer thicknesses, including the contact and wiring resistance, and obtained the minimum combined resistance of 123 mΩ with a copper-layer thickness of 30 μm using our mounting method. In this measurement, a low contact resistance was obtained with a 5-μm-thick copper layer and a contact pressure of 200 kPa or more; however, there is a trade-off with respect to the copper layer thickness in obtaining the minimum combined resistance because of the increasing wiring resistance. Subsequently, based on these measurements, we developed a sandwich structure to decrease the contact resistance, and a contact resistivity of 8.0 × 10-8 Ω·m2 was obtained with the proposed structure.
本文言語 | English |
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論文番号 | 396 |
ジャーナル | Micromachines |
巻 | 10 |
号 | 6 |
DOI | |
出版ステータス | Published - 2019 6月 1 |
ASJC Scopus subject areas
- 制御およびシステム工学
- 機械工学
- 電子工学および電気工学