TY - JOUR
T1 - Scaling guideline of DRAM memory cells for maintaining the retention time
AU - Ueno, Shuichi
AU - Inoue, Yasuo
AU - Inuishi, Masahide
PY - 2000/1/1
Y1 - 2000/1/1
N2 - We propose the model of junction leakage current of local cells. Our model can well explain voltage, temperature dependence and distribution of the leakage current. This model indicates that interface state is considered to control the leakage current and retention time. Based on our model, we found that decreasing the trap density and the electric field are effective for decreasing the leakage current. Moreover, a guideline of trap density, storage capacitance and electric field is proposed for designing future DRAMs to maintain the retention time.
AB - We propose the model of junction leakage current of local cells. Our model can well explain voltage, temperature dependence and distribution of the leakage current. This model indicates that interface state is considered to control the leakage current and retention time. Based on our model, we found that decreasing the trap density and the electric field are effective for decreasing the leakage current. Moreover, a guideline of trap density, storage capacitance and electric field is proposed for designing future DRAMs to maintain the retention time.
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M3 - Conference article
AN - SCOPUS:0033701272
SN - 0743-1562
SP - 84
EP - 85
JO - Digest of Technical Papers - Symposium on VLSI Technology
JF - Digest of Technical Papers - Symposium on VLSI Technology
T2 - 2000 Symposium on VLSI Technology
Y2 - 13 June 2000 through 15 June 2000
ER -