Seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography

Shingo Kataza; Kentaro Ishibashi; Mitsunori Kokubo; Hiroshi Goto; Jun Mizuno; Shuichi Shoji

doi:10.1143/JJAP.48.06FH21

Seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography

Shingo Kataza, Kentaro Ishibashi^*, Mitsunori Kokubo, Hiroshi Goto, Jun Mizuno, Shuichi Shoji

^*この研究の対応する著者

研究成果: Article › 査読

7 被引用数 (Scopus)

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The seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography (UV-NIL) was studied. Large-area nanopatterning is required in the actual mass production of optical devices and biological microchips. We applied the double lithography method of litho-etch-litho-etch for UV-NIL process. The proposed multiple UV-NIL process realized 66 × 45 mm² pattern area, which has 50 nm width and 150 nm space line patterns on a quartz wafer.

本文言語	English
ページ（範囲）	06FH211-06FH213
ジャーナル	Japanese journal of applied physics
巻	48
号	6 PART 2
DOI	https://doi.org/10.1143/JJAP.48.06FH21
出版ステータス	Published - 2009 6月 1

ASJC Scopus subject areas

工学（全般）
物理学および天文学（全般）

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10.1143/JJAP.48.06FH21

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abstract = "The seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography (UV-NIL) was studied. Large-area nanopatterning is required in the actual mass production of optical devices and biological microchips. We applied the double lithography method of litho-etch-litho-etch for UV-NIL process. The proposed multiple UV-NIL process realized 66 × 45 mm2 pattern area, which has 50 nm width and 150 nm space line patterns on a quartz wafer.",

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AU - Kataza, Shingo

AU - Ishibashi, Kentaro

AU - Kokubo, Mitsunori

AU - Goto, Hiroshi

AU - Mizuno, Jun

AU - Shoji, Shuichi

PY - 2009/6/1

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N2 - The seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography (UV-NIL) was studied. Large-area nanopatterning is required in the actual mass production of optical devices and biological microchips. We applied the double lithography method of litho-etch-litho-etch for UV-NIL process. The proposed multiple UV-NIL process realized 66 × 45 mm2 pattern area, which has 50 nm width and 150 nm space line patterns on a quartz wafer.

AB - The seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography (UV-NIL) was studied. Large-area nanopatterning is required in the actual mass production of optical devices and biological microchips. We applied the double lithography method of litho-etch-litho-etch for UV-NIL process. The proposed multiple UV-NIL process realized 66 × 45 mm2 pattern area, which has 50 nm width and 150 nm space line patterns on a quartz wafer.

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JF - Japanese journal of applied physics

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Seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography

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