Self-limiting laser thermal process for ultra-shallow junction formation of 50-nm gate CMOS
Akio Shima*, Hiroshi Ashihara, Toshiyuki Mine, Yasushi Goto, Masatada Horiuchi, Yun Wang, Somit Talwar, Atsushi Hiraiwa
*この研究の対応する著者
研究成果: Conference contribution
22
被引用数
(Scopus)