We demonstrate a production method for self-organized arrays of metal nanoparticles and aligned nanowires. Ion beam-sputtered Si/SiO2 substrates are used as templates for metallic vapor deposition, forming aligned arrays of 5-20 nm silver and cobalt nanoparticles with a period of 35 nm. The 20 nm diameter cobalt nanowires with lengths in excess of a micrometer are produced under appropriate conditions. All processing steps can be integrated into a single vacuum chamber and performed in a matter of minutes at mild temperatures. This inherently scalable technique can be extended to a range of substrate materials, array patterns, and nanoparticle materials.
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