抄録
We demonstrate a production method for self-organized arrays of metal nanoparticles and aligned nanowires. Ion beam-sputtered Si/SiO2 substrates are used as templates for metallic vapor deposition, forming aligned arrays of 5-20 nm silver and cobalt nanoparticles with a period of 35 nm. The 20 nm diameter cobalt nanowires with lengths in excess of a micrometer are produced under appropriate conditions. All processing steps can be integrated into a single vacuum chamber and performed in a matter of minutes at mild temperatures. This inherently scalable technique can be extended to a range of substrate materials, array patterns, and nanoparticle materials.
本文言語 | English |
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論文番号 | 063106 |
ジャーナル | Applied Physics Letters |
巻 | 93 |
号 | 6 |
DOI | |
出版ステータス | Published - 2008 |
外部発表 | はい |
ASJC Scopus subject areas
- 物理学および天文学(その他)