We developed a monolithic sensing plate for a waveguide-mode sensor. The plate consists of a SiO2glass substrate and a thin silicon layer the surface of which is thermally oxidized to form a SiO2glass waveguide. We confirmed that the sensing plate is suitable for high-sensitivity detection of molecular adsorption at the waveguide surface. In addition, a significant enhancement of the sensitivity of the sensor was achieved by perforating the waveguide with holes with diameters of a few tens of nanometers by selective etching of latent tracks created by swift heavy-ion irradiation. Possible strategies for optimizing the plate are discussed.
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