Simple and engineered process yielding carbon nanotube arrays with 1.2 × 10¹³ cm^-2 wall density on conductive underlayer at 400 °c

Engineering & Materials Science

• Carbon nanotubes 100%
• Sputtering 80%
• Chemical vapor deposition 73%
• High resolution transmission electron microscopy 51%
• Substrates 44%
• X-Ray Emission Spectrometry 40%
• Atomic force microscopy 40%
• Partial pressure 37%
• Nucleation 33%
• Annealing 31%
• Integrated circuits 29%
• Catalysts 26%
• Scanning electron microscopy 24%

Chemical Compounds

• Carbon Nanotube 68%
• Sputtering 68%
• Vapor Deposition Apparatus 56%
• Chemical Vapour Deposition 56%
• Partial Pressure 30%
• Energy Dispersive X-Ray Spectroscopy 29%
• Nucleation 25%
• Atomic Force Microscopy 24%
• Annealing 24%
• Scanning Electron Microscopy 18%
• Catalyst 13%
• Application 9%