TY - JOUR
T1 - Stranski-Krastanov growth of tungsten during chemical vapor deposition revealed by micro-auger electron spectroscopy
AU - Noda, Suguru
AU - Tsumura, Takeshi
AU - Fukuhara, Jota
AU - Yoda, Takashi
AU - Komiyama, Hiroshi
AU - Shimogaki, Yukihiro
PY - 2004/10
Y1 - 2004/10
N2 - Chemical vapor deposition (CVD) of tungsten is an important process to make interconnections in advanced integrated-circuit devices. As device dimensions continue to decrease, incomplete nucleation inside the trenches and via holes is becoming a crucial issue. In this work, micro-Auger electron spectroscopy with in-plane spatial resolution was applied for the first time to study the nucleation and growth process of W islands. Results showed that W grew slowly and uniformly on TiN surfaces up to about one-monolayer coverage, and then W islands nucleated and started to grow rapidly. This transition from layer to island shows that W grew by Stranski-Krastanov mode during CVD on TiN from WF6 and SiH4. Drastic difference might exist in chemical reactivity between the initial W layer on TiN surfaces and the W islands, causing the change in W growth rate.
AB - Chemical vapor deposition (CVD) of tungsten is an important process to make interconnections in advanced integrated-circuit devices. As device dimensions continue to decrease, incomplete nucleation inside the trenches and via holes is becoming a crucial issue. In this work, micro-Auger electron spectroscopy with in-plane spatial resolution was applied for the first time to study the nucleation and growth process of W islands. Results showed that W grew slowly and uniformly on TiN surfaces up to about one-monolayer coverage, and then W islands nucleated and started to grow rapidly. This transition from layer to island shows that W grew by Stranski-Krastanov mode during CVD on TiN from WF6 and SiH4. Drastic difference might exist in chemical reactivity between the initial W layer on TiN surfaces and the W islands, causing the change in W growth rate.
KW - Chemical vapor deposition
KW - Micro-auger electron spectroscopy
KW - Nucleation and growth
KW - Stranski-Krastanov growth
KW - Titanium nitride
KW - Tungsten
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U2 - 10.1143/JJAP.43.6974
DO - 10.1143/JJAP.43.6974
M3 - Article
AN - SCOPUS:10844297909
SN - 0021-4922
VL - 43
SP - 6974
EP - 6977
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
IS - 10
ER -