抄録
The applicability of tandem mass spectrometry to the quality analysis of metal-surface protect surfactants without any pretreatment or purification of the sample solution was investigated. Three typical spectra were constructed and verified by FAB CID-MS/MS using sodium n-dodecylsulfate (anionic surfactant), tetradecyl dimethylbenzylammonium chloride (cationic surfactant) and heptaethylene glycol mono-n-dodecyl ether (nonionic surfactant) as a model. The FAB CID-MS/MS spectra of metal-surface protect surfactants provided useful structural information that analyte surfactants have a polyoxyethylene structure, which has been identified as a nonionic surfactant. The authors concluded that FAB CID-MS/MS will be a good analytical method for direct quality analysis without any pretreatment or purification of the metal-surface protect surfactant for industrial use.
本文言語 | English |
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ページ(範囲) | 797 |
ページ数 | 1 |
ジャーナル | BUNSEKI KAGAKU |
巻 | 48 |
号 | 8 |
DOI | |
出版ステータス | Published - 1999 |
ASJC Scopus subject areas
- 分析化学