TY - GEN
T1 - Sub-picosecond exciton spin-relaxation in GaN
AU - Tackeuchi, Atsushi
AU - Kuroda, Takamasa
AU - Otake, Hirotaka
AU - Taniguchi, Kazuyoshi
AU - Chinone, Takako
AU - Liang, Ji Hao
AU - Kajikawa, Masataka
AU - Horio, Naochika
PY - 2006/5/23
Y1 - 2006/5/23
N2 - Exciton spin relaxations in bulk GaN were directly observed with sub-picosecond's time resolution. The obtained spin relaxation times of A-band free exciton are 0.47 ps - 0.25 ps at 150 K - 225 K. The spin relaxation time of the acceptor bound exciton at 15K is measured to be 1.1 ps. These are at least one order of magnitude shorter than those of the other III-V compound semiconductors. The spin relaxation time of A-band free exciton is found to be proportional to T1.4, where T is the temperature. The fact that the spin relaxation time in GaN is shorter than that in GaAs, in spite of the small spin-orbit splitting, suggests that the spin relaxation is dominated by the defect-assisted Elliot-Yafet process.
AB - Exciton spin relaxations in bulk GaN were directly observed with sub-picosecond's time resolution. The obtained spin relaxation times of A-band free exciton are 0.47 ps - 0.25 ps at 150 K - 225 K. The spin relaxation time of the acceptor bound exciton at 15K is measured to be 1.1 ps. These are at least one order of magnitude shorter than those of the other III-V compound semiconductors. The spin relaxation time of A-band free exciton is found to be proportional to T1.4, where T is the temperature. The fact that the spin relaxation time in GaN is shorter than that in GaAs, in spite of the small spin-orbit splitting, suggests that the spin relaxation is dominated by the defect-assisted Elliot-Yafet process.
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U2 - 10.1117/12.640263
DO - 10.1117/12.640263
M3 - Conference contribution
AN - SCOPUS:33646712167
SN - 0819461601
SN - 9780819461605
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Ultrafast Phenomena in Semiconductors and Nanostructure Materials X
T2 - Ultrafast Phenomena in Semiconductors and Nanostructure Materials X
Y2 - 23 January 2006 through 25 January 2006
ER -