Substrate Bias Effect on SOI-based Thermoelectric Power Generator

Hiroshi Inokawa*, Yuto Goi, Toshiaki Yorigami, Kyohei Shirotori, Hiroaki Satoh, Motohiro Tomita, Takeo Matsuki, Hiroya Ikeda, Takanobu Watanabe

*この研究の対応する著者

研究成果: Conference contribution

抄録

Thermoelectric characteristics of phosphorus-doped silicon (Si) nanowire (NW) are evaluated in terms of the substrate bias effect. It is found that the narrower wire is more sensitive to the substrate voltage presumably due to the field crowding effect. In case of 200-nm-wide NW, application of 40 V to the substrate increases the NW conductance by a factor of 55.4, and leads to ×25.9 improvement in power generation, even though the Seebeck coefficient is reduced to 74%. The result suggests that the performance of the Si thermoelectric generator could be improved or optimized by the substrate bias control.

本文言語English
ホスト出版物のタイトル17th International Conference on Quality in Research, QIR 2021
ホスト出版物のサブタイトルInternational Symposium on Electrical and Computer Engineering
出版社Institute of Electrical and Electronics Engineers Inc.
ページ119-122
ページ数4
ISBN(電子版)9781665496964
DOI
出版ステータスPublished - 2021
イベント17th International Conference on Quality in Research, QIR 2021: International Symposium on Electrical and Computer Engineering - Virtual, Online, Indonesia
継続期間: 2021 10月 132021 10月 15

出版物シリーズ

名前17th International Conference on Quality in Research, QIR 2021: International Symposium on Electrical and Computer Engineering

Conference

Conference17th International Conference on Quality in Research, QIR 2021: International Symposium on Electrical and Computer Engineering
国/地域Indonesia
CityVirtual, Online
Period21/10/1321/10/15

ASJC Scopus subject areas

  • ハードウェアとアーキテクチャ
  • 電子工学および電気工学
  • 安全性、リスク、信頼性、品質管理
  • 制御と最適化

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