抄録
Superconductivity was achieved above 10 K in heavily boron-doped diamond thin films deposited by the microwave plasma-assisted chemical vapor deposition (CVD) method. Advantages of the CVD method are the controllability of boron concentration in a wide range, and a high boron concentration, compared to those obtained using the high-pressure high-temperature method. The superconducting transition temperatures of homoepitaxial (111) films are determined to be 11.4 K for TC onset and 8.4 K for zero resistance from transport measurements. In contrast, the superconducting transition temperatures of (100) films TC onset = 6.3 K and TC zero = 3.2 K were significantly suppressed.
本文言語 | English |
---|---|
ページ(範囲) | 911-914 |
ページ数 | 4 |
ジャーナル | Diamond and Related Materials |
巻 | 16 |
号 | 4-7 SPEC. ISS. |
DOI | |
出版ステータス | Published - 2007 4月 |
ASJC Scopus subject areas
- 電子材料、光学材料、および磁性材料
- 化学 (全般)
- 機械工学
- 材料化学
- 電子工学および電気工学