Surface topography of sputtered CuxMo6S8 films

R. Ohtaki; B. R. Zhao; H. L. Luo; N. M. Davis

doi:10.1016/0025-5408(82)90038-1

Surface topography of sputtered Cu_xMo₆S₈ films

R. Ohtaki^*, B. R. Zhao, H. L. Luo, N. M. Davis

^*この研究の対応する著者

研究成果: Article › 査読

7 被引用数 (Scopus)

抄録

The Chevrel phase Cu_xMo₆S₈ was prepared with the technique of sputtering, and its surface micro-structure was observed using scanning electron microscopes (SEM). It was found that the surface micro-structure depends strongly on the sputtering conditions, particularly on the substrate temperature. An attempt to obtain smooth film surfaces for analytical purposes was successful.

本文言語	English
ページ（範囲）	575-578
ページ数	4
ジャーナル	Materials Research Bulletin
巻	17
号	5
DOI	https://doi.org/10.1016/0025-5408(82)90038-1
出版ステータス	Published - 1982 5月
外部発表	はい

ASJC Scopus subject areas

材料科学（全般）
凝縮系物理学
材料力学
機械工学

文献へのアクセス

10.1016/0025-5408(82)90038-1

他のファイルとリンク

引用スタイル

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title = "Surface topography of sputtered CuxMo6S8 films",

abstract = "The Chevrel phase CuxMo6S8 was prepared with the technique of sputtering, and its surface micro-structure was observed using scanning electron microscopes (SEM). It was found that the surface micro-structure depends strongly on the sputtering conditions, particularly on the substrate temperature. An attempt to obtain smooth film surfaces for analytical purposes was successful.",

author = "R. Ohtaki and Zhao, {B. R.} and Luo, {H. L.} and Davis, {N. M.}",

note = "Funding Information: *Supported by the NSF Grant #DMR-8108421.",

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PY - 1982/5

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