Synchrotron-radiation photochemical-vapor deposition of amorphous carbon

High-energy synchrotron-radiation (SR) light was applied to the photochemical-vapor deposition of amorphous carbon films. The source gases of CH₄ and H₂ have been directly photodissociated by the ultraviolet SR light to deposit carbon films on the heated Si substrate. The film structure was characterized by field-emission scanning electron microscopy, Raman scattering, and infrared absorption, which indicate the film to be a rigid amorphous structure comprised of mostly sp³-bonded carbon. The advantage as well as the limitation of the synchrotron-radiation process to the synthesis of functional materials is discussed.