Formation behavior of nanovoids during the annealing of amorphous Al 2O3 and WO3 was studied by transmission electron microscopy. The density and size of the voids in Al2O 3 and WO3 increase with increasing annealing temperature from 973 to 1123 K and from 573 to 673 K, respectively. It is suggested that the formation of nanovoids during annealing is attributed to the large difference in density between as-deposited amorphous and crystalline oxides.
|Eco-Materials Processing and Design XII
|Trans Tech Publications Ltd
|Published - 2011
|Materials Science Forum
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