The effects of UV irradiation on titania deposition from titanium tetra-isopropoxide

Yasuyuki Egashira*, Masato Sugimachi, Kouichi Nishizawa, Kazunobu Saito, Toshio Ohsawa, Hiroshi Komiyama

*この研究の対応する著者

研究成果: Article査読

4 被引用数 (Scopus)

抄録

The influence of UV irradiation on the deposition of titania from titanium tetra-isopropoxide (TTIP) under reduced pressure was studied. It was found that UV irradiation accelerates the titania growth rate by a factor of 2-3 in the temperature range of 573 to 623 K. The coverage quality of micron-size trenches in the cases with and without UV irradiation indicates the role of the photo-enhanced surface reaction. The threshold wavelength of 380 nm which is equivalent to the energy gap of anatase indicates strongly that band-to-band excitation is responsible for the photo-enhanced surface reaction.

本文言語English
ページ(範囲)389-392
ページ数4
ジャーナルApplied Surface Science
79-80
C
DOI
出版ステータスPublished - 1994 5月 2
外部発表はい

ASJC Scopus subject areas

  • 表面、皮膜および薄膜

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