Two-dimensional photonic crystals of titanium dioxide are predicted to have many advantages over semiconductor photonic crystals, e.g., silicon and GaAs: in particular, low optical loss in the near infrared region used for optical communication, low thermal expansion, and a refractive index which is close to that of optical fibers. However, it is difficult to create micro-nano structures in titanium dioxide, since semiconductor micro-fabrication techniques cannot be applied to titanium dioxide. As the first step, we calculated the photonic band gap of titanium dioxide rod-slab on SiO2. Band gap percent against thickness of the rod-slab was also examined. Finally, we confirmed the most suitable structure for 2D photonic crystals. A deep X-ray lithography technique was employed to create a very deep and precise template. Liquid-phase deposition was then used to faithfully deposit a tightly packed layer of titanium oxide onto the template. Finally, the template was selectively removed to obtain a photonic nano-structure. A template for the most appropriate three dimensional structure was also fabricated using the method proposed by Yablonovitch. By employing the same method, we successfully obtained the 3D structure of TiO 2.
|ジャーナル||Proceedings of SPIE - The International Society for Optical Engineering|
|出版ステータス||Published - 2005|
|イベント||Nanoengineering: Fabrication, Properties, Optics, and Devices II - San Diego, CA, United States|
継続期間: 2005 8月 3 → 2005 8月 4
ASJC Scopus subject areas
- コンピュータ サイエンスの応用