The phenomenon of underpotential deposition (UPD) has received considerable attention during the past two decades. One aspect of underpotential deposition which has not yet been carefully investigated, however, is the influence of the solvent on the overall process. This communication will attempt to provide insight into this issue by comparing the UPD of a specific species on the same metal surface in two different solvents. The UPD of cadmium on single crystal Ag(III) in water propylene carbonate, solutions was selected as a model system.
|ジャーナル||Electrochemical Society Extended Abstracts|
|出版ステータス||Published - 1985 1月 1|
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