Visible photoluminescence from Si clusters in γ-irradiated amorphous SiO2

Hiroyuki Nishikaw*, Eiki Watanabe, Daisuke Ito, Yuryo Sakurai, Kaya Nagasawa, Yoshimichi Ohki

*この研究の対応する著者

研究成果: Article査読

120 被引用数 (Scopus)

抄録

Visible photoluminescence (PL) bands around 2 eV were studied in 60Co γ-irradiated (dose<1 MGy) oxygen-deficient-type amorphous SiO2 (a-SiO2) excited by 2-4 eV photons. In addition to the well-known 1.9 eV PL band due to nonbridging oxygen note centers, another PL band was observed at 2.2 eV when excited by 3.8 eV photons. The intensity of the 2.2 eV band increases with decreasing oxygen partial pressure during the sample preparation. Electron-spin-resoaance measurements show that the intensity of the 2.2 eV band is correlated with the concentration of the E'δ center. a paramagnetic state of a cluster of silicons. After much higher δ irradiation with a dose up to 10 MGy, a new PL band was induced at 1.75 eV under excitation by 2.5 eV photons, as well as the 1.9 and 2.2 eV PL bands. By comparing its spectral shape and excitation energy with known PL band in Si-implanted a-SiO2, it is suggested that the 1.75 eV band is associated with Si nanocrystals formed from Si clusters in a-SiO2 by the high-dose γ irradiation

本文言語English
ページ(範囲)3513-3517
ページ数5
ジャーナルJournal of Applied Physics
80
6
DOI
出版ステータスPublished - 1996 9月 15

ASJC Scopus subject areas

  • 物理学および天文学(全般)

フィンガープリント

「Visible photoluminescence from Si clusters in γ-irradiated amorphous SiO2」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル