TY - JOUR
T1 - Work function of polycrystalline Ag, Au and Al
AU - Uda, M.
AU - Nakamura, A.
AU - Yamamoto, T.
AU - Fujimoto, Y.
PY - 1998/3
Y1 - 1998/3
N2 - Work functions of polycrystalline Ag, Au and Al films were measured by the photoelectric method, which were deposited on amorphous quartz. These films were preferentially oriented, and an oriented plane, i.e. (111), and a degree of orientation were determined precisely by X-ray diffraction. The work functions of well-defined polycrystalline Ag increased from 4.35 to 4.64 eV after annealing at 500°C, but those of Au and Al remain almost unchanged after annealing at 350°C, i.e. 5.40 and 4.30 eV, respectively. The low work function of Ag before annealing was explained by the appearance of the local density of state near the Fermi edge of Ag, which is due to formation of the stacking fault in f.c.c. Ag during deposition.
AB - Work functions of polycrystalline Ag, Au and Al films were measured by the photoelectric method, which were deposited on amorphous quartz. These films were preferentially oriented, and an oriented plane, i.e. (111), and a degree of orientation were determined precisely by X-ray diffraction. The work functions of well-defined polycrystalline Ag increased from 4.35 to 4.64 eV after annealing at 500°C, but those of Au and Al remain almost unchanged after annealing at 350°C, i.e. 5.40 and 4.30 eV, respectively. The low work function of Ag before annealing was explained by the appearance of the local density of state near the Fermi edge of Ag, which is due to formation of the stacking fault in f.c.c. Ag during deposition.
KW - Ag
KW - Annealing
KW - Polycrystal
KW - Preferred orientation
KW - Stacking fault
KW - Work function
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U2 - 10.1016/s0368-2048(97)00236-3
DO - 10.1016/s0368-2048(97)00236-3
M3 - Article
AN - SCOPUS:17744409636
SN - 0368-2048
VL - 88-91
SP - 643
EP - 648
JO - Journal of Electron Spectroscopy and Related Phenomena
JF - Journal of Electron Spectroscopy and Related Phenomena
ER -